The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2006
Filed:
Apr. 06, 2005
Yinan Chen, Taipei, TW;
Jeng-ping Lin, Dayuan Township, Taoyuan County, TW;
Feng-chuan Lin, Kaohsiung, TW;
Yinan Chen, Taipei, TW;
Jeng-Ping Lin, Dayuan Township, Taoyuan County, TW;
Feng-Chuan Lin, Kaohsiung, TW;
Nan Ya Technology Corporation, Taipei, TW;
Abstract
Disclosed is a method for pre-retaining CB opening in a DRAM manufacture process, wherein a CB opening is filed with a photo-resist layer and an LPD oxidation layer that is filled at room temperature to avoid damaging caused by conventional etching techniques. The LPD oxidation layer and the photo-resist are replaced easily by a polysilicon layer and a BPSG layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile