The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2006
Filed:
Aug. 27, 2003
Motoyuki Shima, Tokyo, JP;
Hiroyuki Ishii, Tokyo, JP;
Masafumi Yamamoto, Tokyo, JP;
Daichi Matsuda, Tokyo, JP;
Atsushi Nakamura, Tokyo, JP;
Motoyuki Shima, Tokyo, JP;
Hiroyuki Ishii, Tokyo, JP;
Masafumi Yamamoto, Tokyo, JP;
Daichi Matsuda, Tokyo, JP;
Atsushi Nakamura, Tokyo, JP;
JSR Corporation, Tokyo, JP;
Abstract
A radiation-sensitive resin composition comprising (A) a resin comprising at least two recurring units of the formulas (1)–(6) in the total amount of 5–70 mol %, but each in the amount of 1–49 mol %, the resin being insoluble or scarcely soluble in alkali, but becoming easily soluble in alkali by the action of an acid, and (B) a photoacid generator. wherein Ris a hydrogen or methyl and Ris a substituted or unsubstituted alkyl group having 1–4 carbon atoms. The resin composition is useful as a chemically amplified resist having high transmittance of radiation, sensitivity, resolution, dry etching resistance, and pattern profile.