The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2006
Filed:
May. 13, 2004
Gregory M. Jursich, Clarendon Hills, IL (US);
Ronald S. Inman, Lyons, IL (US);
Gregory M. Jursich, Clarendon Hills, IL (US);
Ronald S. Inman, Lyons, IL (US);
American Air Liquide, Inc., Fremont, CA (US);
Abstract
A method of forming an aluminum containing film on a substrate includes providing a precursor having the chemical structure: Al(NRR)(NRR)(NRR); where each of R, R, R, R, Rand Ris independently selected from the group consisting of hydrogen and an alkyl group including at least two carbon atoms. The precursor is utilized to form a film on the substrate including at least one of aluminum oxide, aluminum nitride and aluminum oxy-nitride. Each of the R–Rgroups can be the same or different and can by straight or branched chain alkyls. An exemplary precursor that has is useful in forming aluminum containing films is tris diethylamino aluminum.