The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2006
Filed:
Dec. 22, 2004
Alexei Sheydayi, Gilbert, AZ (US);
Alexei Sheydayi, Gilbert, AZ (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
A valve for redirecting flow in a supercritical fluid or other high pressure processing system is disclosed. In high pressure supercritical carbon dioxide (SCCO2) equipment for semiconductor wafer processing, a major hurtle in providing clean equipment and clean wafers. A clean flow diverting valve is provided having no grease or other contaminants, and having no rubbing seal surfaces, but rather incorporates a magnetically coupled valve actuator to move a ball or other valve seat for diverting flow between a common port and alternative switched ports in a non-rubbing, non-contact manner. The valve is useful in semiconductor wafer high pressure processing tools for redirecting flow from a common inlet to alternative outlets or for admitting flow from alternative inlets to a common outlet.