The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2006
Filed:
Dec. 03, 2003
Tomio Nakayama, Ibaraki, JP;
Hirohisa Oda, Ibaraki, JP;
Hitoshi Ishihama, Ibaraki, JP;
Kazumichi Kuramochi, Ibaraki, JP;
Junya Takahashi, Ibaraki, JP;
Tomio Nakayama, Ibaraki, JP;
Hirohisa Oda, Ibaraki, JP;
Hitoshi Ishihama, Ibaraki, JP;
Kazumichi Kuramochi, Ibaraki, JP;
Junya Takahashi, Ibaraki, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A plasma processing apparatus includes a vacuum chamber that accommodates an object to be processed, and provides a plasma process to the object in a vacuum or reduced pressure environment, a dielectric for transmitting microwaves to the vacuum chamber and for maintaining the vacuum or reduced environment of the vacuum chamber, a plate that has slots for guiding the microwaves to the dielectric, and a temperature control mechanism that has a cooling channel between the plate and the dielectric, and controls temperature of the dielectric.