The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2006
Filed:
Aug. 17, 2004
Tadashi Arii, Tokyo, JP;
Yoshihiro Takata, Tokyo, JP;
Tadashi Arii, Tokyo, JP;
Yoshihiro Takata, Tokyo, JP;
Rigaku Corporation, Akishima, JP;
Abstract
An evolved gas analysis system contains a first measurement step of heating a first sample containing measurement target material and non-measurement target material at a predetermined temperature programming rate and detecting the amount of gas evolved from the first sample; a second measurement step of heating a second sample achieved by excluding the measurement target material from the first sample at the same temperature increasing rate as the first measurement step, and detecting the amount of gas evolved from the second sample; and a correcting step of calculating the amount of gas evolved from the measurement target material on the basis of the detected data of the respective steps.