The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2006
Filed:
Aug. 30, 2004
Eu Gene Chu, Seongnam-si, KR;
Ju Ho MO, Seoul, KR;
Seong Taek Park, Seoul, KR;
Jung Ho Kim, Seoul, KR;
Hyun Yong Lim, Seoul, KR;
Pyeong Han Lee, Suwon-si, KR;
Ja Choon Jeong, Seoul, KR;
Eu Gene Chu, Seongnam-si, KR;
Ju Ho Mo, Seoul, KR;
Seong Taek Park, Seoul, KR;
Jung Ho Kim, Seoul, KR;
Hyun Yong Lim, Seoul, KR;
Pyeong Han Lee, Suwon-si, KR;
Ja Choon Jeong, Seoul, KR;
BeyondMicro Inc, Seoul, KR;
Abstract
A phase change memory device and, more particularly, to a phase change memory cell array suitable for the implementation of a high-density memory device. The phase change memory cell array includes a first access transistor pair and a second access transistor pair formed on a semiconductor substrate to be adjacent to each other while each of the first and second access transistor pairs having a common drain, phase change resistance elements formed on source regions of the access transistors, respectively, and a semiconductor region formed on the same plane as the common drains to electrically connect the common drains of the first and second transistor pairs. The phase change memory cell array and the memory device of are suitable for the implementation of a high-density semiconductor device, and capable of improving the reliability of a contact forming process by securing a sufficient space for the contact forming process.