The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2006
Filed:
Dec. 20, 2004
Jan Jaap Kuit, Veldhoven, NL;
Jan Jaap Kuit, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
The present invention relates to a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate support constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the lithographic apparatus includes an exchangeable object handling apparatus for exchanging an exchangeable object with an exchangeable object loading station and a support, the exchangeable object handling apparatus including three or more end-effectors each capable of exchanging an exchangeable object with one of the supports. Such lithographic apparatus is in particular suited for the streaming of subsequent double exposure jobs.