The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2006
Filed:
Jul. 03, 2002
Takashi Okuyama, Saitama, JP;
Hiroyuki Washiyama, Tokyo, JP;
Takashi Okuyama, Saitama, JP;
Hiroyuki Washiyama, Tokyo, JP;
ORC Manufacturing Co., Ltd., Tokyo, JP;
Abstract
In a multi-exposure drawing method for drawing a pattern on a drawing surface, using an exposure unit including a plurality of optical modulation elements arranged in both a first array-direction and a second array-direction, the exposure unit is moved in relation to the drawing surface in a drawing direction. The drawing direction is inclined to form an angle with respect to the first array-direction, whereby the exposure unit is gradually shifted in the second array-direction during the movement of the exposure unit. The modulation elements are successively and selectively operated based on pattern bit-data to thereby modulate a light beam made incident on each modulation element, whenever the exposure unit is moved in the drawing direction by a distance of 'A+a'. 'A' is a distance corresponding to an integer-multiple of a dimension of a unit exposure zone produced on the drawing surface by each modulation element, and “a” is a smaller distance than the dimension of the unit exposure.