The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2006
Filed:
Dec. 15, 2003
Don Pettibone, San Jose, CA (US);
Stan Stokowski, Danville, CA (US);
Don Pettibone, San Jose, CA (US);
Stan Stokowski, Danville, CA (US);
KLA-Tencor Technologies Corp., Milpitas, CA (US);
Abstract
Reticle inspection systems are provided. One embodiment includes an optical subsystem configured to produce an aerial image of a reticle by simulating dose as a function of position that would be projected into a resist by an exposure system such that the aerial image is substantially equivalent to an image of the reticle that would be projected into the resist by the exposure system. Another embodiment includes an optical subsystem configured to alter one or more properties of light such as polarization transmitted by a reticle and to project the light onto a detector. An additional embodiment includes an optical subsystem configured to form an intermediate aerial image of a reticle at a numerical aperture approximately equal to a numerical aperture at which an exposure system projects an image of the reticle into a resist and to project the intermediate aerial image onto a detector.