The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 07, 2006

Filed:

Nov. 24, 2004
Applicants:

Keith Frank Best, Prunedale, CA (US);

Joseph J. Consolini, Costa Mesa, CA (US);

Shyam Shinde, Fremont, CA (US);

Inventors:

Keith Frank Best, Prunedale, CA (US);

Joseph J. Consolini, Costa Mesa, CA (US);

Shyam Shinde, Fremont, CA (US);

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); H01L 21/301 (2006.01);
U.S. Cl.
CPC ...
Abstract

A device manufacturing method capable of imaging structures on both sides of a substrate, is presented herein. One embodiment of the present invention comprises a device manufacturing method that etches reversed alignment markers on a first side of a substrate to a depth of 10 μm, the substrate is flipped over, and bonded to a carrier wafer and then lapped or ground to a thickness of 10 μm to reveal the reversed alignment markers as normal alignment markers. The reversed alignment markers may comprise normal alignment patterns overlaid with mirror imaged alignment patterns.


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