The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2006
Filed:
Mar. 27, 2001
Applicants:
Kai Yang, San Jose, CA (US);
Darrell M. Erb, Los Altos, CA (US);
Fei Wang, San Jose, CA (US);
Inventors:
Assignee:
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/4763 (2006.01);
U.S. Cl.
CPC ...
Abstract
Damascene processing is implemented with dielectric barrier films () for improved step coverage and reduced contact resistance. Embodiments include the use of two different dielectric films () to avoid misalignment problems. Embodiments further include dual damascene (A,B) processing using Cu metallization ().