The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 07, 2006

Filed:

Apr. 15, 2002
Applicants:

Sheldon Aronowitz, San Jose, CA (US);

Vladimir Zubkov, Mountain View, CA (US);

Grace S. Sun, Mountain View, CA (US);

Inventors:

Sheldon Aronowitz, San Jose, CA (US);

Vladimir Zubkov, Mountain View, CA (US);

Grace S. Sun, Mountain View, CA (US);

Assignee:

LSI Logic Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01);
U.S. Cl.
CPC ...
Abstract

An improved semiconductor memory structure and methods for its fabrication are disclosed. The memory structure includes a semiconductor substrate having a dielectric region formed over a channel region. A doped region is formed between a top portion and a bottom portion of the dielectric region. This doped region includes a suitable electron affinity material. A gate electrode is connected with the top of the dielectric region. In some embodiments, suitable electron affinity materials are introduced into the doped region using implantation techniques. In another embodiment, the electron affinity material is introduced into the doped region using plasma treatment of the dielectric region and the redeposition of additional dielectric material on top of the dielectric region and doped region.


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