The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2006
Filed:
May. 27, 2004
Yoshimi Torii, Tachikawa, JP;
Kazuo Nojiri, Higashimurayama, JP;
Yoshinao Kawasaki, Yamaguchi, JP;
Yoshiaki Sato, Kudamatsu, JP;
Ryooji Fukuyama, Kudamatsu, JP;
Hironobu Kawahara, Kudamatsu, JP;
Yoshimi Torii, Tachikawa, JP;
Kazuo Nojiri, Higashimurayama, JP;
Yoshinao Kawasaki, Yamaguchi, JP;
Yoshiaki Sato, Kudamatsu, JP;
Ryooji Fukuyama, Kudamatsu, JP;
Hironobu Kawahara, Kudamatsu, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
Disclosed is apparatus for treating samples, and a method of using the apparatus. The apparatus includes processing apparatus (a) for treating the samples (e.g., plasma etching apparatus), (b) for removing residual corrosive compounds formed by the sample treatment, (c) for wet-processing of the samples and (d) for dry-processing the samples. A plurality of wet-processing treatments of a sample can be performed. The wet-processing apparatus can include a plurality of wet-processing stations. The samples can either be passed in series through the plurality of wet-processing stations, or can be passed in parallel through the wet-processing stations.