The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2006
Filed:
Jul. 10, 2003
Peng Zhang, Quakertown, PA (US);
Danielle Megan King Curzi, Center Valley, PA (US);
Eugene Joseph Karwacki, Jr., Orefield, PA (US);
Leslie Cox Barber, Cave Creek, AZ (US);
Peng Zhang, Quakertown, PA (US);
Danielle Megan King Curzi, Center Valley, PA (US);
Eugene Joseph Karwacki, Jr., Orefield, PA (US);
Leslie Cox Barber, Cave Creek, AZ (US);
Air Products and Chemicals, Inc., Allentown, PA (US);
Abstract
Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain preferred embodiments, the process solution of the present invention may reduce post-development defects such as pattern collapse when employed as a rinse solution either during or after the development of the patterned photoresist layer. Also disclosed is a method for reducing the number of pattern collapse defects on a plurality of photoresist coated substrates employing the process solution of the present invention.