The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2006
Filed:
Dec. 03, 2003
Christopher F. Lyons, Fremont, CA (US);
Carl P. Babcock, Campbell, CA (US);
Jongwook Kye, Pleasanton, CA (US);
Christopher F. Lyons, Fremont, CA (US);
Carl P. Babcock, Campbell, CA (US);
Jongwook Kye, Pleasanton, CA (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
A method of making a device using a lithographic system having a lens from which an exposure pattern is emitted. A conforming immersion medium can be positioned between a photo resist layer and the lens. The photo resist layer, which can be disposed over a wafer, and the lens can be brought into intimate contact with the conforming immersion medium. The photo resist can then be exposed with the exposure pattern so that the exposure pattern traverses the conforming immersion medium.