The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2006
Filed:
Jun. 30, 2003
Phillip Joe Brock, Sunnyvale, CA (US);
Michael William Chaw, San Jose, CA (US);
Dan J. Dawson, San Jose, CA (US);
Craig J. Hawker, Los Gatos, CA (US);
James L. Hedrick, Pleasanton, CA (US);
Wesley L. Hillman, Morgan Hill, CA (US);
Teddie P. Magbitang, Sunnyvale, CA (US);
Dennis R. Mckean, Milpitas, CA (US);
Robert D. Miller, San Jose, CA (US);
Richard I. Palmisano, San Martin, CA (US);
Jila Tabib, San Jose, CA (US);
Mark C. Thurber, San Jose, CA (US);
Willi Volksen, San Jose, CA (US);
Phillip Joe Brock, Sunnyvale, CA (US);
Michael William Chaw, San Jose, CA (US);
Dan J. Dawson, San Jose, CA (US);
Craig J. Hawker, Los Gatos, CA (US);
James L. Hedrick, Pleasanton, CA (US);
Wesley L. Hillman, Morgan Hill, CA (US);
Teddie P. Magbitang, Sunnyvale, CA (US);
Dennis R. McKean, Milpitas, CA (US);
Robert D. Miller, San Jose, CA (US);
Richard I. Palmisano, San Martin, CA (US);
Jila Tabib, San Jose, CA (US);
Mark C. Thurber, San Jose, CA (US);
Willi Volksen, San Jose, CA (US);
Hitachi Global Storage Technologies Netherlands B.V., Amsterdam, NL;
Abstract
A process for fabricating sliders where the sliders are held in place during processing by a solid matrix material is described. A thin coating of a release-layer material is applied on the sliders before encapsulation in the matrix material. The release-layer material is polyvinyl alcohol and more preferably high molecular weight polyvinyl alcohol which is highly hydrolyzed. Use of the release-layer of the invention maintains the process resistance while providing the advantage of allowing easier removal of the matrix material after it is no longer needed. The release-layer can be applied to encapsulant materials including epoxies, acrylates, polyimides, silsesquioxanes and others. After the selected fabrication process such as the formation of air-bearing features an appropriate solvent is applied to soften the polyvinyl alcohol film and allow clean debonding of the sliders.