The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 17, 2006

Filed:

Feb. 06, 2004
Applicant:

Masataka Sakata, Tokyo, JP;

Inventor:

Masataka Sakata, Tokyo, JP;

Assignee:

Rigaku Corporation, Akishima, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 23/20 (2006.01); G01N 23/207 (2006.01);
U.S. Cl.
CPC ...
Abstract

An apparatus for X-ray analysis includes (1) a focusing optical system including an X-ray source, a specimen table and a two-dimensional X-ray detector, (2) a device for shifting the angle of incidence of X-rays relative to a specimen supported by the specimen table, (3) a device for moving the two-dimensional X-ray detector in parallel with a central axis of rotation of the specimen and (4) a mask arranged in front of the two-dimensional X-ray detector. The mask has a slit arranged on a line intersecting a plane rectangularly intersecting the central axis of rotation of the specimen and containing a central optical axis of incident X-rays. The mask is driven to move in parallel with the axis of rotation of the specimen so that measuring can be conducted.


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