The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2006
Filed:
May. 03, 2004
Katsumi Momose, Tokyo, JP;
Masaru Yamaga, Tokyo, JP;
Shinichi Matsunaga, Tokyo, JP;
Orc Manufacturing Co., Ltd., Tokyo, JP;
Abstract
An apparatus for projection exposure which projects a pattern of a mask onto a work is provided. The apparatus has a base, a source of light, an optical system, a mask support mechanism, a work support mechanism and an alignment mechanism. The optical system constitutes light rays into projection light rays carrying image information of the mask, guiding the projection light rays through a predetermined optical path so that the projection light rays can be projected onto an exposure surface of the work. The optical system includes a projection optical system and an illumination optical system. The projection optical system is adapted to be disposed vertical relative to the base. The mask and work support mechanisms vertically support the mask and work relative to the base, respectively. In this way, the exposure surface of the work can coincide with an image forming plane in the optical path.