The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2006
Filed:
Jul. 21, 2005
Tomoharu Hase, Utsunomiya, JP;
Yukio Yamane, Tokyo, JP;
Tomoharu Hase, Utsunomiya, JP;
Yukio Yamane, Tokyo, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus for exposing a substrate to a pattern of a mask by use of exposure light. The apparatus includes an optical system for directing the exposure light from a light source to the substrate, the optical system having an optical element, a first casing for accommodating therein an optical surface of the optical element, and a second casing for accommodating therein the optical element and the first casing, a first port provided in the first casing, a second port provided in the second casing, a supplier for supplying an inert gas into the first casing and the second casing, and a supplier for supplying an inert gas into the first casing and the second casing through the first port and the second port.