The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 10, 2006

Filed:

Sep. 29, 2004
Applicants:

Ishtiaq Ahsan, Wappingers Falls, NY (US);

Ronald Gene Filippi, Wappingers Falls, NY (US);

Roy Charles Iggulden, Newburgh, NY (US);

Edward William Kiewra, Verbank, NY (US);

Ping-chuan Wang, Hopewell Junction, NY (US);

Inventors:

Ishtiaq Ahsan, Wappingers Falls, NY (US);

Ronald Gene Filippi, Wappingers Falls, NY (US);

Roy Charles Iggulden, Newburgh, NY (US);

Edward William Kiewra, Verbank, NY (US);

Ping-Chuan Wang, Hopewell Junction, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 31/08 (2006.01); G01R 27/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and apparatus for detecting metal extrusion associated with electromigration (EM) under high current density situations within an EM test line by measuring changes in capacitance associated with metal extrusion that occurs in the vicinity of the charge carrying surfaces of one or more capacitors situated in locations of close physical proximity to anticipated sites of metal extrusion on an EM test line are provided. The capacitance of each of the one or more capacitors is measured prior to and then during or after operation of the EM test line so as to detect capacitance changes indicating metal extrusion.


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