The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2006
Filed:
Aug. 29, 2003
Hong Cho, Suwon-si, KR;
Chang-jin Kang, Suwon-si, KR;
Kyeong-koo Chi, Seoul, KR;
Cheol-kyu Lee, Yongin-si, KR;
Hye-jin JO, Anyang-si, KR;
Hong Cho, Suwon-si, KR;
Chang-Jin Kang, Suwon-si, KR;
Kyeong-Koo Chi, Seoul, KR;
Cheol-Kyu Lee, Yongin-si, KR;
Hye-Jin Jo, Anyang-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
A method for optimizing a seasoning recipe for a dry etch process. The method includes setting a critical value of reproducibility, a main etch recipe, and a preliminary seasoning recipe. A test wafer is then etched using the preliminary seasoning recipe in a dry etch chamber. Next, a main etch process is performed with respect to at least 10 run wafers in the dry etch chamber using the main etch recipe and an end-point detection time for each wafer is determined. An initial dispersion and a standard deviation are then determined using the determined end-point detection times. The critical value of reproducibility is then compared to the initial dispersion. If the initial dispersion is equal to or less than the critical value of reproducibility, the preliminary seasoning recipe is used as the seasoning recipe, otherwise the preliminary seasoning recipe is modified and the process is repeated until an optimal seasoning recipe is determined.