The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2006
Filed:
Jun. 26, 2002
Craig M. Carpenter, Boise, ID (US);
Ross S. Dando, Nampa, ID (US);
Dan Gealy, Kuna, ID (US);
Garo J. Derderian, Boise, ID (US);
Allen P. Mardian, Boise, ID (US);
Craig M. Carpenter, Boise, ID (US);
Ross S. Dando, Nampa, ID (US);
Dan Gealy, Kuna, ID (US);
Garo J. Derderian, Boise, ID (US);
Allen P. Mardian, Boise, ID (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
CVD, ALD, and other vapor processes used in processing semiconductor workpieces often require volatilizing a liquid or solid precursor. Certain embodiments of the invention provide improved and/or more consistent volatilization rates by moving a reaction vessel. In one exemplary embodiment, a reaction vessel is rotated about a rotation axis which is disposed at an angle with respect to vertical. This deposits a quantity of the reaction precursor on an interior surface of the vessel's sidewall which is exposed to the headspace as the vessel rotates. Other embodiments employ drivers adapted to move the reaction vessel in other manners, such as a pendulum arm to oscillate the vessel along an arcuate path or a mechanical linkage which moves the vessel along an elliptical path.