The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2006
Filed:
Oct. 27, 2004
Willem Van Schaik, 's-Hertogenbosch, NL;
Bastiaan Matthias Mertens, The Hague, NL;
Hans Meiling, Bilthoven, NL;
Norbertus Benedictus Koster, Delft, NL;
Willem Van Schaik, 's-Hertogenbosch, NL;
Bastiaan Matthias Mertens, The Hague, NL;
Hans Meiling, Bilthoven, NL;
Norbertus Benedictus Koster, Delft, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
In-situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of molecular oxygen. Generally, the space will be purged with an ozoneless purge gas which contains a small amount of molecular oxygen in addition to the usual purge gas composition. The technique can also be used in an evacuated space by introducing a low pressure of molecular oxygen into the space.