The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2006
Filed:
Nov. 04, 2003
Masahiro Hatakeyama, Fujisawa, JP;
Katsunori Ichiki, Fujisawa, JP;
Tohru Satake, Chigasaki, JP;
Yotaro Hatamura, Bunkyo-ku, Tokyo, JP;
Masayuki Nakao, Matsudo, JP;
Masahiro Hatakeyama, Fujisawa, JP;
Katsunori Ichiki, Fujisawa, JP;
Tohru Satake, Chigasaki, JP;
Yotaro Hatamura, Bunkyo-ku, Tokyo, JP;
Masayuki Nakao, Matsudo, JP;
Ebara Corporation, Tokyo, JP;
Other;
Abstract
An optical imprinting apparatus, and a method for producing a two-dimensional pattern, have line widths less than the wavelength of an exposure light. The evanescent (proximity) field effect is adopted to realize the apparatus and method. An optical imprinting apparatus comprises a container in which light is enclosed, an exposure-mask having a proximity field exposure pattern firmly fixed to a section of the container for exposing the exposure pattern on a photo-sensitive material through an evanescent field by the light enclosed therein; and a light source for supplying the light in the container.