The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 26, 2006
Filed:
Sep. 14, 2004
Henricus Wilhelmus Maria Van Buel, Eindhoven, NL;
Keith Frank Best, Prunedale, CA (US);
Joseph J. Consolini, Costa Mesa, CA (US);
Joeri Lof, Eindhoven, NL;
Edwin Ross Shafer, San Jose, CA (US);
Henricus Wilhelmus Maria Van Buel, Eindhoven, NL;
Keith Frank Best, Prunedale, CA (US);
Joseph J. Consolini, Costa Mesa, CA (US);
Joeri Lof, Eindhoven, NL;
Edwin Ross Shafer, San Jose, CA (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus is provided with an optical system built into the wafer table for producing an image of a wafer mark that is provided on the back side of the wafer. The image is located at the plane of the front side of the wafer and can be viewed by an alignment system from the front side of the wafer. Simultaneous alignment between marks on the back and front of the wafer and a mask can be performed using a pre-existing alignment system. The lithographic projection apparatus is further provided with immersion system for providing a fluid between the lens and the substrate.