The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 26, 2006
Filed:
Apr. 12, 2002
Shinji Himori, Nirasaki, JP;
Mitsuhiro Yuasa, Tokyo-To, JP;
Kazuyoshi Watanabe, Niiza, JP;
Jun'ichi Shimada, Niiza, JP;
Shinji Himori, Nirasaki, JP;
Mitsuhiro Yuasa, Tokyo-To, JP;
Kazuyoshi Watanabe, Niiza, JP;
Jun'ichi Shimada, Niiza, JP;
Tokyo Electron Limited, Tokyo-To, JP;
Tokyo Hy-Power Labs, Inc., Saitama-ken, JP;
Abstract
There are provided a matching unit capable of sufficiently matching the impedance of a high frequency load to a transmission path impedance without increasing its size and matching time even if a high frequency power of 70 MHz or higher is supplied thereto, and a plasma processing system using the same. A matching unitcomprises: a resonance rodfor transmitting a high frequency energy from a high frequency power supplyto a plasma producing electrode; a variable capacitor, connected to the resonance rodand an electrodein series, for adjusting the imaginary part of an impedance complex number; a housingwhich is provided outside of the resonance rodand which is grounded; a link coilfor exciting a high frequency energy to the resonance rodand for adjusting the real part of the impedance complex number; and a controllerfor controlling a driving part for the variable capacitorand the link coilso that a series resonance circuit is formed between the high frequency power supplyand the ground via plasma in a matching state.