The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 26, 2006

Filed:

Jul. 08, 2004
Applicants:

Thomas Neil Horsky, Boxborough, MA (US);

John Noel Williams, Boston, MA (US);

Inventors:

Thomas Neil Horsky, Boxborough, MA (US);

John Noel Williams, Boston, MA (US);

Assignee:

SemEquip, Inc., Billerica, MA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 27/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An ion implantation device for vaporizing decaborane and other heat-sensitive materials via a novel vaporizer and vapor delivery system and delivering a controlled, low-pressure drop flow of vapors, e.g. decaborane, into the ion source. The ion implantation device includes an ion source which can operate without an arc plasma, which can improve the emittance properties and the purity of the beam and without a strong applied magnetic field, which can improve the emittance properties of the beam. The ion source is configured so that it can be retrofit into the ion source design space of an existing Bernas source-based ion implanters and the like or otherwise enabling compatibility with other ion source designs.


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