The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2006
Filed:
Dec. 06, 2001
Radiation-sensitive composition changing in refractive index and method of changing refractive index
Isao Nishimura, Tokyo, JP;
Nobuo Bessho, Tokyo, JP;
Atsushi Kumano, Tokyo, JP;
Tsutomu Shimokawa, Tokyo, JP;
Kenji Yamada, Kyoto, JP;
Isao Nishimura, Tokyo, JP;
Nobuo Bessho, Tokyo, JP;
Atsushi Kumano, Tokyo, JP;
Tsutomu Shimokawa, Tokyo, JP;
Kenji Yamada, Kyoto, JP;
JSR Corporation, Tokyo, JP;
Abstract
A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a higher refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing this composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion decompose to create a refractive index difference between the exposed portion and an unexposed portion, thereby forming a pattern having different refractive indices.