The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 19, 2006

Filed:

Oct. 12, 2001
Applicants:

Larry L. Berger, Chadds Ford, PA (US);

Jerald Feldman, Hockessin, DE (US);

Viacheslav Alexandrovich Petrov, Hockessin, DE (US);

Frank L. Schadt, Iii, Wilmington, DE (US);

Andrew E. Feiring, Wilmington, DE (US);

Fredrick Claus Zumsteg, Jr., Wilmington, DE (US);

Inventors:

Larry L. Berger, Chadds Ford, PA (US);

Jerald Feldman, Hockessin, DE (US);

Viacheslav Alexandrovich Petrov, Hockessin, DE (US);

Frank L. Schadt, III, Wilmington, DE (US);

Andrew E. Feiring, Wilmington, DE (US);

Fredrick Claus Zumsteg, Jr., Wilmington, DE (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 1/73 (2006.01); G03C 1/76 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention relates to a photoresist composition comprising a polymeric binder; a photoactive component; and at least one dissolution inhibitor comprising a paraffinic or cycloparaffinic compound containing at least one functional group having the structure —C(R)(R')OR wherein Rand R′ are the same or different fluoroalkyl groups of from one or taken together are (CF)wherein a is an integer ranging from 2 to about 10 and R is a hydrogen atom or an acid labile protecting group. Typically, the dissolution inhibitor has an absorption coefficient of less than about 4.0 μm at a wavelength of 157 nm.


Find Patent Forward Citations

Loading…