The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2006
Filed:
Oct. 16, 2003
Applicants:
Harold F. R. Greer, San Francisco, CA (US);
James A. Fair, Mountain View, CA (US);
Junghwan Sung, Los Altos, CA (US);
Nerissa Sue Draeger, Milpitas, CA (US);
Inventors:
Harold F. R. Greer, San Francisco, CA (US);
James A. Fair, Mountain View, CA (US);
Junghwan Sung, Los Altos, CA (US);
Nerissa Sue Draeger, Milpitas, CA (US);
Assignee:
Novellus Systems, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 9/00 (2006.01); C23F 4/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Carbon monoxide gas is provided in a ruthenium-deposition apparatus to clean undesired ruthenium-containing deposits from apparatus surfaces. Carbon monoxide gas is mixed with reactant gases in apparatus tubing and in a ruthenium-deposition reaction chamber to inhibit formation of undesired ruthenium deposits on apparatus surfaces and to remove ruthenium deposits.