The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 12, 2006

Filed:

Sep. 01, 2004
Applicants:

Jean-luc Lacour, Villabon/Yvette, FR;

Jean-françois Wagner, Drancy, FR;

Vincent Detalle, Montreal, FR;

Patrick Mauchien, Palaiseav, FR;

Inventors:

Jean-Luc Lacour, Villabon/Yvette, FR;

Jean-François Wagner, Drancy, FR;

Vincent Detalle, Montreal, FR;

Patrick Mauchien, Palaiseav, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 3/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

This device comprises a pulsed laser source (), means () for focusing light from this source onto an object to be analysed () to produce plasma on the surface of the object, means () of analyzing a plasma radiation spectrum, means () of determining the elementary composition of the object from this analysis, and possibly means () for displacing the object. The invention is particularly applicable to test radioactive materials.


Find Patent Forward Citations

Lacour, Jean-Luc. (2006). Elementary analysis device by optical emission spectrometry on laser produced plasma (U.S. Patent No. 7106439). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7106439

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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