The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2006
Filed:
May. 13, 2004
Ralph Kurt, Eindhoven, NL;
Levinus Pieter Bakker, Helmond, NL;
Frank Jeroen Pieter Schuurmans, Valkenswaard, NL;
Jan Evert Van Der Werf, Waalre, NL;
Ralph Kurt, Eindhoven, NL;
Levinus Pieter Bakker, Helmond, NL;
Frank Jeroen Pieter Schuurmans, Valkenswaard, NL;
Jan Evert Van Der Werf, Waalre, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus includes an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the beam of radiation with a pattern in its cross section; a substrate table configured to hold a substrate, and a projection system configured to project the patterned beam of radiation onto a target portion of the substrate, wherein the illumination system has a radiation source and at least one mirror configured to enhance an output of the source. The illumination system may include a second radiation source and at least one mirror positioned between the radiation sources to image the output of the second source onto the first source, thereby enhancing the output of the source. The radiation sources may be operable to emit radiation in the EUV wavelength range.