The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2006
Filed:
Dec. 18, 2002
Tomoki Nagai, Tokyo, JP;
Daisuke Shimizu, Tokyo, JP;
Tsutomu Shimokawa, Tokyo, JP;
Fumihisa Miyajima, Tokyo, JP;
Masaaki Miyaji, Tokyo, JP;
Tomoki Nagai, Tokyo, JP;
Daisuke Shimizu, Tokyo, JP;
Tsutomu Shimokawa, Tokyo, JP;
Fumihisa Miyajima, Tokyo, JP;
Masaaki Miyaji, Tokyo, JP;
JSR Corporation, Tokyo, JP;
Abstract
1. A copolymer having recurring units of the following formulas (1), (2), and (3), wherein R, R, R, and Rare a hydrogen atom or a methyl group, R, R, and Rrepresent a monovalent organic group, k is 1 or 2, 1 is 0–4, n is 1–3, m is 0–3, Ris a substituted methyl group, 1-substituted ethyl group, 1-branched alkyl group, triorganosilyl group, triorganogermyl group, alkoxycarbonyl group, acyl group, or cyclic acid-dissociable group, with two or more Rgroups being the same or different, q is 1–3, and p is 0–3, the copolymer having a GPC average molecular weight of 3,000–100,000. The composition is useful as a polymer component for a radiation-sensitive resin composition suitable as a chemically-amplified resist.