The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2006
Filed:
Apr. 28, 2003
Applicants:
Pieter Willem Herman DE Jager, Rotterdam, NL;
Pieter Kruit, Delft, NL;
Arno Jan Bleeker, Westerhoven, NL;
Karel Diederick Van Der Mast, Helmond, NL;
Inventors:
Pieter Willem Herman de Jager, Rotterdam, NL;
Pieter Kruit, Delft, NL;
Arno Jan Bleeker, Westerhoven, NL;
Karel Diederick van der Mast, Helmond, NL;
Assignees:
Elith LLC, Tempe, AZ (US);
Agere Systems Guardian Corp., Orlando, FL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03B 27/42 (2006.01); G03B 27/32 (2006.01); G21K 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Various options for improving throughput in an e-beam lithography apparatus are described. A slider lens moves in synchronism with the scanning motion of the electron beam.