The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2006
Filed:
Aug. 20, 2002
Byung-uk Kim, Hwaseong, KR;
Joon-yeon Cho, Hwaseong, KR;
Kyong-il Kwon, Hwaseong, KR;
Soo-jung Park, Hwaseong, KR;
Jae-won Yoo, Hwaseong, KR;
Byung-Uk Kim, Hwaseong, KR;
Joon-Yeon Cho, Hwaseong, KR;
Kyong-Il Kwon, Hwaseong, KR;
Soo-Jung Park, Hwaseong, KR;
Jae-Won Yoo, Hwaseong, KR;
Dongjin Semichem Co., Ltd., Incheon, KR;
Abstract
The present invention relates to a photosensitive resin composition for use as a photoresist, and more particularly, to a photosensitive resin composition for a photoresist comprising an acrylate copolymer obtained by selectively using specific compounds or controlling the ratio of unreacted monomers, and a 1,2-quinonediazide compound, which is excellent in several performance factors such as dielectric characteristics, flatness, transparency, developing performance, residual film rate, chemical resistance, and heat resistance, as well as sensitivity and resolution, and in particular it facilitates easy pattern formation into interlayer dielectrics, and it can be used as a photoresist in an LCD manufacturing process due to its excellent transmissivity even when prepared as a thick film.