Soo-Jung Park

Title: The Innovations of Soo-Jung Park

Introduction

Soo-Jung Park is a notable inventor based in Hwaseong, South Korea. She has made significant contributions to the field of materials science, particularly in the development of photosensitive resin compositions for photoresists. Her work is essential in advancing technologies used in the manufacturing of electronic devices.

Latest Patents

Soo-Jung Park holds a patent for a photosensitive resin composition designed for use as a photoresist. This invention focuses on an acrylate copolymer that is selectively synthesized using specific compounds or by controlling the ratio of unreacted monomers. The resin composition includes a 1,2-quinonediazide compound, which enhances various performance factors such as dielectric characteristics, flatness, transparency, developing performance, residual film rate, chemical resistance, and heat resistance. Notably, it facilitates easy pattern formation into interlayer dielectrics and is particularly useful in LCD manufacturing processes due to its excellent transmissivity, even when prepared as a thick film.

Career Highlights

Soo-Jung Park is currently employed at Dongjin Semichem Co., Ltd., where she continues to innovate in the field of photoresist materials. Her expertise and dedication have positioned her as a key figure in her company and the industry at large.

Collaborations

Some of her notable coworkers include Byung-uk Kim and Joon-Yeon Cho, who contribute to the collaborative environment that fosters innovation at Dongjin Semichem Co., Ltd.

Conclusion

Soo-Jung Park's contributions to the field of materials science, particularly through her patented innovations, highlight her role as a leading inventor in the industry. Her work not only advances technology but also sets a foundation for future developments in electronic manufacturing processes.