The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 05, 2006

Filed:

Mar. 05, 2001
Applicants:

James F. Zucherman, San Francisco, CA (US);

Ken Y. Hsu, San Francisco, CA (US);

Charles J. Winslow, Walnut Creek, CA (US);

Henry A. Klyce, Piedmont, CA (US);

Inventors:

James F. Zucherman, San Francisco, CA (US);

Ken Y. Hsu, San Francisco, CA (US);

Charles J. Winslow, Walnut Creek, CA (US);

Henry A. Klyce, Piedmont, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61B 17/70 (2006.01);
U.S. Cl.
CPC ...
Abstract

A spine distraction implant alleviates pain associated with spinal stenosis and facet arthropathy by expanding the volume in the spine canal and/or neural foramen. The implant provides a spinal extension inhibitor while allowing freedom of spinal flexion. The implant includes an elliptically-shaped spacer for positioning between and spacing apart the spinous processes.

Published as:
US2001012938A1; WO0207623A1; US7101375B2;

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