The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2006
Filed:
Jul. 09, 2003
Sachiyo Ito, Yokohama, JP;
Masamitsu Itoh, Yokohama, JP;
Masahiko Hasunuma, Yokohama, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A photomask comprises a substrate, a translucent film selectively formed on the substrate, and a shading film selectively formed on the translucent film, wherein when the substrate, the translucent film and the shading film have Young's moduli (MPa) EEand E, and film thickness (m) d, dand drespectively, internal stresses (MPa) of the translucent film and the shading film at room temperature are sand srespectively, a covering rate by the translucent film defined by an area in which the shading film is not formed is expressed as h, and coefficients are expressed as k=1.3×10, k=−9.5×10, k=6.0×10, and k=−5.2×10respectively, the substrate, the translucent film and the shading film satisfy a condition given by the following expression: