The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 29, 2006

Filed:

Feb. 27, 2003
Applicants:

Francesco Derege Thesauro, Naperville, IL (US);

Vlasta Brusic, Geneva, IL (US);

Benjamin P. Bayer, Aurora, IL (US);

Inventors:

Francesco DeRege Thesauro, Naperville, IL (US);

Vlasta Brusic, Geneva, IL (US);

Benjamin P. Bayer, Aurora, IL (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention provides a method of polishing a substrate comprising a noble metal comprising (i) contacting the substrate with a CMP system and (ii) abrading at least a portion of the substrate to polish the substrate. The CMP system comprises an abrasive and/or polishing pad, a liquid carrier, and a sulfonic acid compound.


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DeRege Thesauro, Francesco. (2006). Cmp method for noble metals (U.S. Patent No. 7097541). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7097541

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