The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2006
Filed:
Feb. 27, 2003
Applicants:
Francesco Derege Thesauro, Naperville, IL (US);
Vlasta Brusic, Geneva, IL (US);
Benjamin P. Bayer, Aurora, IL (US);
Inventors:
Francesco DeRege Thesauro, Naperville, IL (US);
Vlasta Brusic, Geneva, IL (US);
Benjamin P. Bayer, Aurora, IL (US);
Assignee:
Cabot Microelectronics Corporation, Aurora, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
The invention provides a method of polishing a substrate comprising a noble metal comprising (i) contacting the substrate with a CMP system and (ii) abrading at least a portion of the substrate to polish the substrate. The CMP system comprises an abrasive and/or polishing pad, a liquid carrier, and a sulfonic acid compound.