The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2006
Filed:
Dec. 19, 2003
Lucas Henricus Johannes Stevens, Eindhoven, NL;
Martinus Hendrikus Antonius Leenders, Rotterdam, NL;
Hans Meiling, Bilthoven, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Lucas Henricus Johannes Stevens, Eindhoven, NL;
Martinus Hendrikus Antonius Leenders, Rotterdam, NL;
Hans Meiling, Bilthoven, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, a plurality of optical elements that form part of at least one of the radiation system, the patterning structure, and the projection system; and a cleaning device. The cleaning device includes at least one cleaning beam of radiation, and a gas. The cleaning device is configured to clean an individual optical element or a subset of the plurality of optical elements.