The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2006
Filed:
Mar. 18, 2004
Andres Fernadez, Dublin, CA (US);
Marian Mankos, San Francisco, CA (US);
Jeffrey S. Sullivan, Berkeley, CA (US);
Paul C. Allen, Beaverton, OR (US);
Andres Fernadez, Dublin, CA (US);
Marian Mankos, San Francisco, CA (US);
Jeffrey S. Sullivan, Berkeley, CA (US);
Paul C. Allen, Beaverton, OR (US);
Other;
Abstract
An electron beam lithography system has an electron gun including at least one laser that is operable in a first mode to generate electrons for lithography. The electron beam lithography system is operable in a second mode to regenerate the photocathode of the electron gun by application of the laser. The photocathode includes a layer of cesium telluride.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile