The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2006
Filed:
Dec. 27, 2004
Joachim Deppe, Dresden, DE;
Christoph Kleint, Dresden, DE;
Christoph Ludwig, Langebruck, DE;
Josef Willer, Riemerling, DE;
Joachim Deppe, Dresden, DE;
Christoph Kleint, Dresden, DE;
Christoph Ludwig, Langebruck, DE;
Josef Willer, Riemerling, DE;
Infineon Technologies AG, Munich, DE;
Infineon Technologies Flash GmbH & Co. KG, Dresden, DE;
Abstract
In the method, trenches are etched and, in between, bit lines () are in each case arranged on doped source/drain regions (). Storage layers () are applied and gate electrodes () are arranged at the trench walls. After the introduction of polysilicon, which is provided for the gate electrodes (), into the trenches, the top side is ground back in a planarizing manner until the top side of the covering layer () is reached, and afterward a polysilicon layer (), which is provided for the word lines, is applied over the whole area and patterned to form the word lines.