The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 2006

Filed:

Sep. 15, 2003
Applicants:

Oleg P. Kishkovich, Greenville, RI (US);

Anatoly Grayfer, Newton, MA (US);

William M. Goodwin, Medway, MA (US);

Devon Kinkead, Holliston, MA (US);

Inventors:

Oleg P. Kishkovich, Greenville, RI (US);

Anatoly Grayfer, Newton, MA (US);

William M. Goodwin, Medway, MA (US);

Devon Kinkead, Holliston, MA (US);

Assignee:

Entegris, Inc., Chaska, MN (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 1/00 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides passive sampling systems and methods for monitoring contaminants in a semiconductor processing system. In one embodiment, that passive sampling system comprises a collection device in fluid communication with a sample line that provides a flow of gas from a semiconductor processing system. The collection device is configured to sample by diffusion one or more contaminants in the flow of gas.


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