The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2006
Filed:
Jan. 13, 2005
Levinus Pieter Bakker, Helmond, NL;
Jeroen Jonkers, Aaschen, DE;
Frank Jeroen Pieter Schuurmans, Valkenswaard, NL;
Hugo Matthieu Visser, Utrecht, NL;
Levinus Pieter Bakker, Helmond, NL;
Jeroen Jonkers, Aaschen, DE;
Frank Jeroen Pieter Schuurmans, Valkenswaard, NL;
Hugo Matthieu Visser, Utrecht, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus includes a radiation system configured to form a beam of radiation from radiation emitted by a radiation source, as well as a support configured to hold a patterning device, which when irradiated by the beam of radiation provides the beam of radiation with a pattern. A substrate table is configured to hold a substrate, and a projection system is configured to image an irradiated portion of the patterning device onto a target portion of the substrate. The radiation system further includes an aperture at a distance from the optical axis, a reflector which is placed behind the aperture when seen from the source and a structure placed in a low radiation intensive region behind the aperture.