The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 01, 2006

Filed:

Mar. 04, 2003
Applicants:

Hiroyuki Hosoba, Kyoto-fu, JP;

Atsuo Tsunoda, Kashiba, JP;

Hiroshi Hayashi, Kyoto-fu, JP;

Inventors:

Hiroyuki Hosoba, Kyoto-fu, JP;

Atsuo Tsunoda, Kashiba, JP;

Hiroshi Hayashi, Kyoto-fu, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 33/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

In this semiconductor laser device, an InGaP etching block layeras an etching selection layer having etching selectivity for an n-type AlInP current block layer, which is a non-optical-absorption layer, is formed on the n-type current block layer. Since this etching block layerprevents the current block layeron both sides of a ridgefrom being etched during manufacture, a contact layercan be prevented from entering gaps between the sides of this ridgeand the current block layer. Therefore, light oscillating in an active layeris taken out from a device end surface without being absorbed in the contact layer. According to this semiconductor laser device, an oscillation threshold current and an operation current can be maintained low, deterioration of differential quantum efficiency can be prevented and reliability can be improved.


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