The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2006
Filed:
Jun. 10, 2003
Patricia Argandona, Poughkeepsie, NY (US);
Faisal Azam, Fishkill, NY (US);
Andrew LU, Poughkeepsie, NY (US);
Helen Wang, LaGrangeville, NY (US);
Patricia Argandona, Poughkeepsie, NY (US);
Faisal Azam, Fishkill, NY (US);
Andrew Lu, Poughkeepsie, NY (US);
Helen Wang, LaGrangeville, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
The systems and methods enable the determination of the magnitude and direction of overlay of at least two elements in two layers. Overlay measurements along two axes can be obtained using four probe pads and without requiring a decoder. Overlay measurements along a single axis can be obtained using three probe pads and without requiring a decoder. The systems and methods according to this invention require less space and are more time efficient than conventional measurement structures. In the systems and methods of this invention, offsets in a direction are calculated from resistance measurements.