The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2006
Filed:
Oct. 27, 2004
Wolfgang Lammer-pachlinger, Vienna, AT;
Gertraud Lammer, Vienna, AT;
Alfred Chalupka, Vienna, AT;
IMS Nanofabrication GmbH, Vienna, AT;
Abstract
In a pattern-definition device () for use in a particle-beam exposure apparatus, a beam of electrically charged particles is patterned through a plurality of apertures. The device comprises at least one deflector array means having a plurality of openings surrounding the beamlets, wherein for each opening are provided at least two deflecting electrodes to which different electrostatic potentials are appliable, thus correcting the path of the beamlet(s) passing through the respective opening according to a desired path through the device (). According to a partition of the plurality of apertures into a set of subfields (Aij), the deflecting electrodes belonging to the same subfield (Aij) have common electric supplies. Thus, the electrostatic potentials of the deflecting electrodes belonging to the same subfield (Aij) are constant or linearly interpolated between basic potentials fed at basic points (Pij) of the respective subfield.