The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2006
Filed:
Jun. 17, 2003
Erik A. Edelberg, Castro Valley, CA (US);
Robert P. Chebi, Foster City, CA (US);
Gladys Sowan Lo, Fremont, CA (US);
Erik A. Edelberg, Castro Valley, CA (US);
Robert P. Chebi, Foster City, CA (US);
Gladys Sowan Lo, Fremont, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
Methods of etching a carbon-rich layer on organic photoresist overlying an inorganic layer can utilize a process gas including CHF, where y≧x and z≧0, and one or more optional components to generate a plasma effective to etch the carbon-rich layer with low removal of the inorganic layer. The carbon-rich layer can be removed in the same processing chamber, or alternatively can be removed in a different processing chamber, as used to remove the bulk photoresist.