The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 25, 2006
Filed:
Nov. 27, 2002
Hua-yu Liu, Palo Alto, CA (US);
Hua-Yu Liu, Palo Alto, CA (US);
Synopsys, Inc., Mountain View, CA (US);
Abstract
One embodiment of the invention provides a system that uses simulation results to select evaluation points for a model-based optical proximity correction (OPC) operation. Upon receiving a layout, the system first selects critical segments in the layout, and then performs a dense simulation on the critical segments. This dense simulation identifies deviations (or low contrast) between a desired layout and a simulated layout at multiple evaluation points on each of the critical segments. Next, for each critical segment, the system selects an evaluation point from the multiple evaluation points on the critical segment based on results of the dense simulation. The system then performs a model-based OPC operation using the selected evaluation point for each critical segment.